Physical Vapour Deposition

The QAMEC facilites have total of five PVD systems: 1 evaporation system used purely for non energetic Al depsoition and 4 sputtering systems.  The systems take a 150mm diameter target material and can accommodate substrate sizes from 50mm to 150mm.

Targets available for sputtering : Tungsten (W), Titanium (Ti), Tantalum (Ta), Copper (Cu), Nickle (Ni), Silicon (Si), Gold (Au), Aluminium (Al/AlSi)